NEW Pelcotec™ Etched Si CDMS ISO

NEW Pelcotec™ Etched Si CDMS ISOAvailable as NIST Traceable or as Certified against NIST Standard Easy to use and very useful for quick and precise SEM, FE SEM, FIB, CD SEM, LM, and AFM magnification calibration in the X axis from the etched lines. Fully featured and traceable calibration standards for a wide measurement range. They are made using the latest semiconductor and MEMS manufacturing techniques for etching features yielding superior line edge quality (Line edge roughness

PELCO Synaptek™ grids are available with a standard oval 1x2mm slot

Available in 1 quart and 1 gallon container

easy-to-read black ink

and reducing storage complexity and grid box inventory requirements

Angular Accuracy

The rugged tray used as a drain rack can hold up to 200 microscope slides in 100 individual numbered slots

7µm +/-1µm Tip Height 17µm +/-2µm 17µm +/-2µm 17µm +/-2µm 17µm +/-2µm Tip Set Back 15µm +/-5µm 15µm +/-5µm 15µm +/-5µm 15µm +/-5µm Tip Radius < 10nm Coating None or Aluminum Reflex Half Cone Angle 20° - 25° along cantilever axis

Designed to use in vacuum deposition systems for applications such as carbon evaporation

100 slide capacity 3 x 1" (75 x 25mm)

and cross-sections of electronic devices

6mm (thin) Electron Microscope Apertures for ZEISS/LEO are made either of Platinum/Iridium (95%Pt&5%Ir) alloy or Molybdenum and have two profiles in cross-section:

Applied Physics Letters