Boron-Doped Diamond on Silicon Substrate

Boron-Doped Diamond on Silicon SubstrateA Boron Doped Diamond (BDD) on Silicon Substrate (Si) is a high performance material that combines the excellent properties of diamond with the versatility of silicon. The substrate consists of a conductive silicon wafer that is coated with a thin layer of boron doped diamond. Boron doping introduces p type conductivity to the diamond layer, enhancing its electrical properties and making it suitable for use in electrochemical applications. This

auto fuel emission control systems and to meet or exceed government

(2'' to 1'')

We specifically recommend tantalum wire as the electrical contact

55 lbs Certification CE Certified

Orientation:     <210> +/-0

3% Storage and Handling: Powder in bottle covered by vacuum Al bag Non-harzard product 1 year shelf life if under 38

Pack:                    Packed in 100 grade plastic bag under 1000 class clean room

The gas flow caused the valves to open and close automatically

2 mm ID × 16 mm L

crystal purity:             >99

Outside: 405mmD x 360mmW x 285mmH (16"Dx 14"W x 11"H)

5   (mm3)