SKU:45900748460

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm

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Regular price $35.11 USD
Regular price $82.11 USD Sale price $35.11 USD
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Ships within 48 hours · Estimated delivery Jul 25 - Jul 30

Description

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mmSilicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both side on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced micro cracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 10x5x0. 5mm Edge: CNC Ground Surface Quality: 60 40 or beer Non effective Area:

Orientation:    (110) +/-3 o

Pore Size: 0

Melting Temperature      ~ 700 ºC

Back Surface Finish           (N Face)

Formula weight:   40

0mm            XRD Plate package

and the thermal couple with the sample holder can be moved inside a quartz tube driven by a magnet manually to find a desirable temperature position inside the tube for evaporation or deposition

Please order our new version air compressor with more HP

Aluminum foil Thickness 16 um

Conductor type:                S-C-P

When the pouch cell is fabricated

Optical Transmission Range

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Exchange/Return Notes
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